Part I Introduction |
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1 Solid Surfaces, Their Structure and Composition |
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C. Klauber, R. St. C. Smart |
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3 | (4) |
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1.1 Importance of the Surface |
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3 | (4) |
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1.2 Solid Surfaces of Different Materials |
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7 | (5) |
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1.2.1 A Material Under Attack: Aluminium |
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11 | (1) |
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1.3 Methods of Surface Analysis |
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12 | (1) |
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1.3.1 Variety of Surface Analytical Techniques |
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12 | (1) |
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13 | (10) |
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1.4.1 Direct Physical Imaging |
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13 | (15) |
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1.4.2 Indirect Structural Imaging - Relaxation and Reconstruction |
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28 | |
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1.5 Composition of the Surface Selvedge |
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23 | (19) |
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1.5.1 Electron Inelastic Meun Free Paths |
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24 | (4) |
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1.5.2 Variation of Elemental Sensitivities |
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28 | (3) |
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1.5.3 Practical Detection Limits |
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31 | (1) |
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1.5.4 Practical Bpatial Lömite |
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32 | (5) |
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1.5.5 Chemical State Information |
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37 | (4) |
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1.5.6 Laboratory Standards |
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41 | (1) |
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1.5.7 Inter-laboratory Errors |
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41 | (1) |
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1.6 Defect and Reaction Sites at Surfaces |
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42 | (4) |
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1.7 Electronic Structure at Surfaces |
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46 | (3) |
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1.8 Structures of Adsorbed Layers |
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49 | (2) |
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1.9 Structure in Depth Profiles Through Surfaces |
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51 | (4) |
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55 | (6) |
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1.10.1 Grain Structures, Phase Distributions and Inclusions |
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55 | (1) |
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1.10.2 Fracture Faces and Intergranular Regions |
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55 | (2) |
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57 | (3) |
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1.10.4 Precipitates, Reaction Products and Recrystallised Particles on Surfaces |
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60 | (1) |
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60 | (1) |
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1.11 Technique-Induced Artifacts |
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61 | (4) |
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1.11.1 Radiation Damage 6l |
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1.11.2 Electrostatic Charging |
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64 | (1) |
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65 | |
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7l | (78) |
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2.1 The Need for Ultrahigh Vacuum |
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71 | (3) |
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74 | (2) |
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76 | (2) |
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2.4 Specimen Handling: ASTM Standards |
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78 | (3) |
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81 | (4) |
PART II Techniques |
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3 Electron Microscope Techniques for Surface Characterization |
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P.S.Turner, C.E. Nockolds, S. Bullock |
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85 | (22) |
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3.1 What Do We Need to Know About Surface Structures? |
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86 | (1) |
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3.2 Electron Optical Imaging Systems |
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87 | (4) |
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89 | (1) |
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90 | (1) |
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3.3 Scanning Electron Microscopy of Surfaces |
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91 | (8) |
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91 | (1) |
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3.3.2 The Signals and Detectors |
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92 | (1) |
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3.3.3 Resolution and Contrast in SEM Images |
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93 | (4) |
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3.3.4 Variable Pressure SEM and Envrionmental SEM |
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97 | (1) |
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3.3.5 Energy Dispersive X-Ray Spectrometry |
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98 | (1) |
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3.4 Transmission Electron Microscopy of Surfaces |
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99 | (4) |
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3.4.1 The Transmission Electron Microscope |
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99 | (2) |
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3.4.2 Electron Diffraction |
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101 | (1) |
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3.4.3 Image Contrast and Resolution in the TEM |
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101 | (1) |
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3.4.4 Imaging Surface Structures in the TEM |
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102 | (1) |
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3.4.5 Reflection Electron Microscopy |
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103 | (1) |
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103 | (1) |
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104 | (3) |
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4 Sputter Depth Profiling |
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107 | (20) |
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4.1 Analysis of a Sputter Depth Profile |
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108 | (7) |
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4.1.1 Calibration of the Depth Scale |
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108 | (4) |
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4.1.2 Calibration of the Concentration Scale |
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112 | (3) |
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4.2 The Depth Resolution of Sputter Profiling |
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115 | (8) |
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4.2.1 Specification of the Depth Resolution |
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115 | (2) |
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4.2.2 Instrumental Factors Determining the Depth Resolution |
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117 | (2) |
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4.2.3 Surface Effects Determining the Depth Resolution |
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119 | (1) |
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4.2.4 Bulk Effects Affecting the Depth Resolution |
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120 | (1) |
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4.2.5 Minimisation of the Depth Resolution |
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121 | (2) |
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123 | (1) |
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123 | (4) |
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5 SIMS - Secondary Ion Mass Spectrometry |
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R.J. MacDonald, B.V. King |
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127 | (28) |
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128 | (10) |
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128 | (2) |
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5.1.2 Advantages and Disadvantages of SIMS |
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130 | (1) |
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5.1.3 The Yield of Secondary Ions |
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131 | (7) |
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5.2 Construction of a Secondary Ion Mass Spectrometer |
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138 | (7) |
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5.3 Topics in SIMS Analysis |
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145 | (5) |
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5.3.1 Signal Enhancement by Surface Adsorption |
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145 | (2) |
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5.3.2 Using Secondary Ion Energies in SIMS Analysis |
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147 | (2) |
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5.3.3 The Relative Sensitivity Factor |
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149 | (1) |
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150 | (3) |
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153 | (2) |
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6 Auger Electron Spectroscopy and Microscopy - Techniques and Applications |
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155 | (20) |
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155 | (1) |
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155 | (3) |
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158 | (1) |
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159 | (1) |
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160 | (9) |
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161 | (1) |
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162 | (1) |
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163 | (1) |
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6.5.4 Scanning Auger Microscopy |
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164 | (3) |
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6.5.5 Depth Profiling Mode |
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167 | (1) |
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6.5.6 Preferential Sputtering |
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167 | (1) |
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168 | (1) |
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168 | (1) |
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169 | (2) |
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169 | (1) |
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6.6.2 Surface Diffusion and Segregation |
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170 | (1) |
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171 | (1) |
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171 | (4) |
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7 X-Ray Photoelectron Spectroscopy |
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175 | (28) |
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175 | (4) |
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175 | (1) |
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176 | (2) |
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7.1.3 Surface Specificity |
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178 | (1) |
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179 | (5) |
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7.2.1 Essential Components |
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179 | (3) |
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7.2.2 Optional Components |
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182 | (1) |
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7.2.3 Synchrotron Radiation |
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183 | (1) |
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183 | (1) |
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184 | (5) |
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7.3.1 Spin-Orbit Splitting |
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184 | (1) |
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185 | (1) |
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7.3.3 Auger Chemical Shifts in XPS |
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186 | (1) |
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7.3.4 X-Ray Line Satellites |
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187 | (1) |
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187 | (1) |
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188 | (1) |
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189 | (1) |
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7.4 Quantitative Analysis |
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189 | (2) |
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7.5 Experimental Techniques |
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191 | (4) |
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7.5.1 Variation of X-Ray Sources |
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191 | (1) |
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191 | (3) |
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194 | (1) |
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194 | (1) |
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7.6 Comparison with Other Techniques |
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195 | (2) |
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197 | (1) |
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197 | (1) |
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198 | (5) |
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8 Vibrational Spectroscopy of Surfaces |
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203 | (26) |
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203 | (3) |
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206 | (15) |
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8.2.1 Diffuse Reflectance Infrared Fourier Transform (DRIFT) |
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207 | (2) |
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8.2.2 Attenuated Total Reflectance Spectroscopy (ATR) |
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209 | (7) |
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8.2.3 Photoacoustic Spectroscopy (PAS) |
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216 | (3) |
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8.2.4 Infrared Emission Spectroscopy (IES) |
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219 | (2) |
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8.3 Fourier transform Raman spectroscopy |
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221 | (3) |
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224 | (3) |
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227 | (2) |
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9 Rutherford Backscattering Spectrometry end Nuclear Reaction Analysis |
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229 | (18) |
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229 | (2) |
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231 | (3) |
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232 | (1) |
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233 | (1) |
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9.3 Rutherford Backscattering Spectrometry |
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234 | (6) |
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9.3.1 Experimental Considerations |
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236 | (1) |
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236 | (2) |
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238 | (2) |
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9.4 Nuclear Reaction Analysis |
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240 | (5) |
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241 | (1) |
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9.4.2 Experimental Considerations |
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242 | (1) |
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243 | (2) |
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245 | (1) |
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246 | (1) |
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10 Materials Characterization by Scanned Probe Analysis |
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247 | (40) |
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247 | (4) |
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10.2 The Surface Analytical Context |
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251 | (1) |
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251 | (2) |
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253 | (9) |
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253 | (3) |
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10.4.2 Scanning Force Microscopy (SFM) |
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256 | (1) |
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10.4.3 Intermittent Contact Mode |
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257 | (1) |
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258 | (2) |
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10.4.5 Lateral Force Microscopy (LFM) |
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260 | (2) |
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10.5 Procedures for 'Best Practice' |
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262 | (5) |
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10.5.1 Spatial Characteristics of Scanners |
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263 | (1) |
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10.5.2 Determination of cN and cT |
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264 | (1) |
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10.5.3 Determination of Spring Constants |
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265 | (1) |
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10.5.4 Determination of Actual Tip Parameters in the Mesoscopic Regime |
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266 | (1) |
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10.6 Illustrative Case Studies |
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267 | (16) |
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10.6.1 Surface and Defect Structures of WTe2 Investigated by UHV-STM |
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267 | (2) |
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10.6.2 Organic Thin Film and Surface Mechanical Characterization |
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269 | (4) |
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10.6.3 AFM Analysis of 'Soft' Biological Materials |
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273 | (5) |
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10.6.4 Nanotribology of Solid Lubricants |
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278 | (5) |
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283 | (4) |
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11 Low Energy Ion Scattering |
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287 | (20) |
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11.1 Qualitative Surface Analysis |
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287 | (2) |
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11.2 Advantage of Recoil Detection |
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289 | (2) |
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11.3 Quantitative Analysis |
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291 | (8) |
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11.3.1 Scattered Ion Yield |
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291 | (1) |
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11.3.2 Differential Scattering Cross Section |
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291 | (1) |
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292 | (3) |
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11.3.4 Relative Measurements |
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295 | (2) |
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297 | (2) |
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11.4 Surface Structural Analysis |
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299 | (3) |
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11.4.1 Multiple Scattering |
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299 | (1) |
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11.4.2 Impact Collision Ion Surface Scattering (ICISS) |
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300 | (2) |
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11.5 Experimental Apparatus |
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302 | (2) |
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304 | (3) |
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12 Reflection High Energy Electron Diffraction |
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307 | (12) |
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309 | (3) |
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312 | (6) |
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318 | (1) |
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13 Low Energy Electron Diffraction |
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319 | (18) |
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13.1 The Development of LEED |
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319 | (1) |
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320 | (4) |
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13.2.1 Sample Preparation |
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323 | (1) |
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323 | (1) |
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13.3 Diffraction from a Surface |
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324 | (2) |
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13.3.1 Bragg Peaks in LEED Spectra |
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325 | (1) |
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13.4 LEED Intensity Analysis |
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326 | (2) |
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328 | (1) |
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13.6 Applications of LEED |
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329 | (4) |
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13.6.1 Determination of the Symmetry and Size of the Unit Mesh |
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329 | (1) |
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13.6.2 Unit Meshes for Chemisorbed Systems |
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330 | (1) |
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13.6.3 LEED Intensity Analysis |
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330 | (2) |
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13.6.4 Surface Barrier Analysis |
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332 | (1) |
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333 | (1) |
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334 | (3) |
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14 Ultraviolet Photoelectron Spectroscopy of Solids |
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337 | (10) |
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14.1 Experimental Considerations |
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339 | (1) |
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340 | (4) |
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14.3 Fermi Surface Studies |
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344 | (1) |
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345 | (2) |
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347 | (30) |
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347 | (1) |
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15.2 Experimental Details |
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348 | (11) |
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15.2.1 Synchrotron Radiation |
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350 | (2) |
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15.2.2 Synchrotron Beamlines for EXAFS |
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352 | (2) |
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354 | (1) |
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355 | (2) |
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15.2.5 Acquiring EXAFS Data |
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357 | (2) |
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15.3 Theory of X-ray Absorption |
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359 | (3) |
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359 | (2) |
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361 | (1) |
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362 | (4) |
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362 | (1) |
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15.4.2 Conversion to k-space |
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363 | (1) |
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15.4.3 Background Subtraction |
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363 | (1) |
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15.4.4 Fourier Transformation |
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364 | (1) |
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15.4.5 Fourier Filtering and Back Transformation |
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364 | (1) |
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15.4.6 Modelling and Least Squares Fitting to the EXAFS Equation |
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365 | (1) |
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366 | (11) |
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15.5.1 Surface EXAFS of Titanium Nanostructure Thin Films |
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366 | (4) |
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15.5.2 Ion-Implantation Induced Amorphisation of Germanium |
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370 | (1) |
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371 | (6) |
Part III Processes and Applications |
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16 Minerals, Ceramics and Glasses |
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377 | (28) |
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380 | (9) |
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16.1.1 Iron Oxides in Mineral Mixtures |
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380 | (1) |
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16.1.2 Surface Layers on Minerals |
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381 | (1) |
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16.1.3 Mineral Processing of Sulfide Ores |
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381 | (5) |
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16.1.4 Adsorption and Reaction of Oxide and Clay Minerals |
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386 | (1) |
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16.1.5 Surface Modification of Minerals |
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387 | (2) |
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389 | (6) |
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16.2.1 Leaching and Dissolution |
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390 | (2) |
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16.2.2 Ceramic Surface Layers: Bioceramics |
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392 | (3) |
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395 | (10) |
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16.3.1 Leached and Recrystallised surfaces |
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395 | (3) |
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16.3.2 Surface Modification of Glass Surfaces |
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398 | (2) |
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400 | (5) |
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17 Characterization of Catalysts by Surface Analysis |
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405 | (30) |
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17.1 Examples of Catalytic Systems Studied by XPS |
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408 | (12) |
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408 | (1) |
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17.1.2 Tungsten Oxide Catalysts |
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409 | (3) |
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17.1.3 Palladium on Magnesia |
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412 | (2) |
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17.1.4 Cobalt on Kieselguhr Catalysts |
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414 | (2) |
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416 | (4) |
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17.2 Examples of Catalytic Systems Studied by FT-Infrared Spectroscopy |
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420 | (12) |
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420 | (6) |
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17.2.2 Thin Alumina Films |
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426 | (2) |
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17.2.3 Rhodium Supported Alumina Films |
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428 | (1) |
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17.2.4 Copper Supported Silica Films |
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429 | (3) |
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432 | (1) |
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432 | (3) |
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18 Application to Semiconductor Devices |
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435 | (20) |
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18.1 Micro and Nano-Analysis of Integrated Circuits |
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436 | (7) |
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18.2 Analytical Techniques in the Characterisation of Ohmic Metal/Semiconductor Contacts |
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443 | (9) |
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452 | (1) |
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452 | (3) |
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19 Characterisation of Oxidised Surfaces |
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J.L. Cocking, G.R. Johnston |
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455 | (18) |
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19.1 The Oxidation Problem |
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456 | (1) |
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19.2 Oxidation of Co-22Cr-11A1 |
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457 | (7) |
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19.2.1 Chemical Characterisation |
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458 | (1) |
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19.2.2 Scanning Auger Microscopy |
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458 | (1) |
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19.2.3 Rutherford Backscattering Analysis |
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459 | (5) |
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19.3 Oxidation of Ni-18Cr-6A1 0.5Y |
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464 | (9) |
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19.3.1 Extended X-Ray Absorption Fine Structure |
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466 | (5) |
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471 | (2) |
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473 | (16) |
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474 | (12) |
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20.1.1 Grain Boundaries in Steel |
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474 | (1) |
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475 | (3) |
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478 | (1) |
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478 | (5) |
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20.1.5 Treated Metallic Coating Surface |
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483 | (1) |
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20.1.6 Metal Polymer Interface |
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483 | (1) |
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484 | (2) |
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486 | (1) |
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486 | (3) |
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489 | (16) |
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21.1 Thin Film Photovoltaics |
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490 | (2) |
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21.1.1 Use for Solar Electricity |
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490 | (1) |
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21.1.2 The Thin Film Solar Cell: Glass/ITO/mCdS/pCdTe/Au |
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491 | (1) |
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492 | (4) |
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21.2.1 Low Level Impurities Qualitative |
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492 | (2) |
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21.2.2 Low Level Impurities Quantitative |
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494 | (1) |
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21.2.3 Doping Profiles in Thin Films |
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495 | (1) |
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21.3 Composition and Thickness of Layered Films |
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496 | (5) |
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21.3.1 Composition Gradation in Films, e.g. CdxHg1-xTe Films on Platinum |
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496 | (1) |
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21.3.2 Thin Overlayers on Films |
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497 | (4) |
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21.4 Beam Effects in Thin Film Analysis |
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501 | (1) |
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502 | (3) |
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22 Identification of Adsorbed Species |
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505 | (14) |
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22.1 Examples of Adsorption Studies |
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505 | (13) |
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22.1.1 Nitric Oxide Adsorption on Metals |
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505 | (6) |
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22.1.2 Aurocyanide Adsorption on Carbon |
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511 | (3) |
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22.1.3 Adsorbed Methoxy on Copper and Platinum |
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514 | (4) |
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518 | (1) |
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518 | (1) |
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23 Surface Analysis of Polymers |
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H.A.W. StJohn, T.R. Gengenbach, P.G. Hartley, H.J. Griesser |
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519 | (34) |
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23.1 Specific Properties of Polymers |
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520 | (5) |
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23.2 Surface Contamination and Additives |
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525 | (4) |
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23.3 Contact Angle Measurements |
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529 | (1) |
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23.4 X-Ray Photoelectron Spectroscopy (XPS) |
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529 | (8) |
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529 | (2) |
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23.4.2 Angle-Resolved XPS |
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531 | (1) |
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23.4.3 Inelastic Mean Free Path in Polymers |
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532 | (1) |
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533 | (1) |
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23.4.5 Derivatization of Chemical Groups |
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534 | (3) |
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23.5 Secondary Ion Mass Spectrometry (SIMS) |
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537 | (3) |
|
23.6 Scanning Probe Microscopy Methods: Scanning Tunneling Microscopy (STM) and Atomic Force Microscopy (AFM) |
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|
540 | (3) |
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|
543 | (4) |
|
|
547 | (1) |
|
23.9 Grazing Angle Infrared Spectroscopy |
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|
548 | (1) |
|
|
549 | (4) |
|
24 Glow Discharge Optical Emission Spectrometry |
|
|
|
|
553 | (3) |
|
|
553 | (2) |
|
|
555 | (1) |
|
|
556 | (1) |
|
|
556 | (1) |
|
|
556 | (1) |
|
24.3.3 Semiconductor Processing |
|
|
557 | (2) |
|
|
559 | |
Part IV Appendix |
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|
Acronyms Used in Surface and Thin Film Analysis |
|
|
563 | (6) |
|
Surface Science Bibliography |
|
|
569 | (8) |
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|
577 | |